Theris Nanotechnology provides state-of-the-art UHV (Ultra-High Vacuum) Nanoparticle Deposition Equipment designed for complete user control over nanomaterial fabrication. Our NanoStream™ sources utilize a terminated gas condensation method, where DC magnetron sputtering generates a vapor that condenses into an ultra-pure, size-selected nanoparticle beam.

This process enables precise manipulation of charged nanoparticles, allowing for unparalleled control over the final film properties.

Precise Size Selection: Generate nanoparticles with narrow size distributions, tunable from just 30 atoms up to 20 nm in diameter.

Tunable Impact Energy & Film Morphology: Precisely control particle acceleration to achieve soft landing of intact nanoparticles, create highly porous films with exceptional surface area, or fuse particles to form dense, crystalline layers.

Ultra-High Purity: The UHV environment and gas-phase synthesis ensure the creation of ligand-free and contaminant-free nanoparticle films, ideal for sensitive applications.

Advanced Material Synthesis: Create complex structures including high-entropy alloy and core-shell nanoparticles with full process control.