Desciption
Electron beam evaporation is employed to provide
a vapor stream from materials commonly difficult
to evaporate with standard thermal techniques.
An energetic electron beam is targeted onto
the source material which has the effect of
increasing the temperature. There is no intrinsic
limit to the temperature which can be attained
using this method, in contrast to conventional
radiative or indirect resistive heating processes.
Mini electron beam
evaporators are employed to give maximum control
of the evaporation rate at low fluxes and,
importantly, to minimize contamination of
the vapor stream for sensitive application
areas such as surface science or thin-film
doping. The construction of mini e-beam evaporators
should therefore be aimed at maximizing the
evaporation control and minimizing contamination.
The MANTIS EV-Series mini
e-beam evaporators are constructed from high-quality,
strictly UHV-compatible materials. The mounting
hearth for the source material(s) and the
surrounding evaporation head are highly-efficiently
cooled, ensuring a rapid heat transfer to
the cooling water. This allows all but the
emission filament and the source material
to remain at near ambient temperature, ensuring
negligible outgassing during operation.
The sources are all equipped as standard with
flux monitoring plates. These allow precise
determination of the flux emerging from the
source, and hence give the user excellent
control of the deposition rate.
MANTIS QUAD-EV evaporators
use independent filaments, flux-monitoring
plates and high-voltage connections to allow
each material to be evaporated independently
of the other three. In the QUAD-EV-C source,
this is employed to allow independent co-evaporation
of up to four materials. Since each material
uses an independent high-voltage connection,
the evaporator will still function if there
is a short-circuit due to accidental overheating
of material in one of the pockets.
The power supplies are of a
rugged construction, enabling seamless operation
without shut-down or malfunction during discharges
between the filament and source material (as
can happen during initial operation after
pump-down).
All evaporators can be equipped
with either rods or crucibles interchangeably.
The choice of which of the two is used depends
on the rate required, the material capacity
required and the properties of the source
material. Please contact us for recommendations. |