Nanotechnology from Mantis Deposition Ltd. UK.


NanoCluster Deposition Source

The NanoGen50 source is designed for the deposition of size-selected nanoparticles under UHV conditions.

NanoCluster Deposition System

The Nanosys500 system is a dedicated system for the deposition of nanoparticulate films.


RF Atom Source

The MATS series RF atom sources can be used to grow high-quality oxides or nitride films using highly reactive, yet low energy atomic species.


Mini E-beam Evaporators

The EV series mini e-beam evaporators are designed for highly-controlled evaporation of materials under ultra-clean UHV conditions
Thermal Gas Crackers- The MGC75 thermal gas cracker is designed as source of atomic hydrogen and oxygen in UHV applications where low operational pressure and minimal contamination is required.

RF Ion Source

RF ion sources generate a beam of energetic ions for applications such as ion-beam assisted deposition, sputter deposition and milling

Magnetron Sputtering Sources

The CUSP series magnetron sputtering cathodes are designed for high-rate, large area coatings. We offer UHV, HV and internal mount versions for 1" to 3" target

Deposition System

Mantis Deposition offers turn-key deposition systems with an emphasis on configuration flexibility. Our systems are based around our own UHV deposition components and extensive experience with deposition processes.